ФОТОХИМИЧЕСКАЯ УСТОЙЧИВОСТЬ КОМПЛЕКСОВ С MG(II) И CU(II) ФЕНОКСИПРОИЗВОДНЫХ ФТАЛОЦИАНИНОВ
Аннотация
В представленной работе исследована устойчивость фталоцианинатов магния (II) и меди (II), содержащих нитрогруппу, бензотриазольные и фенилэтилфенокси фраг-менты к действию УФ-излучения в бензоле. Рассчитаны константы скорости фотоде-струкции фталоцианинов при 20 °C. Показано, что введение атома Mg в координацион-ную полость фталоцианина повышает скорость разрушения макроциклов под действием ультрафиолетового света, по сравнению с комплексами Cu(II). Этот факт объясняется различным характером связывания металла с внутрициклическими атомами азота. Определено, что степень ковалентного связывания металла, скорость фотодеструкции и способность к люминесценции находятся в определенной зависимости друг от друга.
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